Impact of interconnect pattern density information on a 90nm technology ASIC design flow

FREE-DOWNLOADP Zarkesh-Ha, S Lakshminarayann, K Doniger… – 2003
The importance of an interconnect pattern density model in ASIC design flow for a 90nm technology
is presented. It is shown that performing the timing analysis at the worst-case corner model for
interconnect variation, without the knowledge of interconnect pattern density, often results .

IEEE PROJECTS 2019

IEEE PROJECTS